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Hot Chuck Heater 300mm
For semiconductor wafer heating. Vacuum‑brazed 6061 T6 aluminum heater with a surface finish of 2‑3 Ra µin.
The design features proprietary internal element patterns, notches and thermocouple holes, with additional manufacturing steps implemented to achieve the 2‑3 Ra µin finish.
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Specifications
• Temperature uniformity ±1%
• Temperature range: 50°C‑450°C
• "Mirror‑finish" surface roughness of 2‑3 Ra µin
• Hard‑coat anodized
• 6061 T6 Aluminum
• 20‑megohm isolation at 1000 VDC
• Withstand voltage 2E+1K at 3 mA
• Flatness: 0.0001" before ramp
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