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Overview
Vacuum heater base for manufacturing 300 mm silicon wafers. Required temperature in vacuum is ~650°C. Constructed from 304 stainless steel, with a 2.75 CF flange at the bottom. It features three small top‑surface steps for lifting wafers and a three‑pin placement position to prevent wafers from sliding off the heater.
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Features
• Temperature: 650℃‑700℃
• CF 2.75 bottom vacuum flange, base‑mounted
• Helium leak rate of 1 x 10‑9 cc/sec He upon completion of helium assembly
• Thermal break between heater top and CF flange
• Built‑in ungrounded thermocouple for over‑temperature protection or control
• Additional TC for reading ungrounded bottom temperature
• 1900 Watts (±10%), 240 Volts
• Mounting threads at the bottom of the assembly
• Material: 304 stainless steel
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