deposition systems (e.g., CVD, PVD, ALD). We offer mineral‑insulated wafer heaters (also known as substrate heaters or platen heaters) suited
for critical conditions, with specifications that meet the special and diverse requirements of these processes. Fully custom substrate heaters are
often the optimal solution, yet we also supply a range of standard disc heaters. Whatever customers choose, our products and recommendations
are reliable, enhancing overall process stability by ensuring superior temperature uniformity.
What is the purpose of the wafer heater?
Wafer heaters are mainly used in thin‑film deposition systems, particularly in the semiconductor industry. They are also applied in solar panel,
nanotechnology, photolithography, annealing and optical device industries, as well as thin‑film deposition systems. In these vacuum processes,
ultra‑thin coatings (sometimes only a few atoms thick) are applied to surfaces in a vacuum. A wide range of technologies are employed, all of which
require different substrate heating elements whose properties and designs are matched to the operating temperature and the type of deposited material.
Our wafer heaters are used in the following processes:
ALD (Atomic Layer Deposition) at 200°C to 400°C
• CVD (Chemical Vapor Deposition) above 900°C
• PVD (Physical Vapor Deposition) at 200°C to 400°C
• PLD (Pulsed Laser Deposition) at 500°C
• PECVD (Plasma‑Enhanced Chemical Vapor Deposition) at 200°C to 400°C
• Sputtering (coating the substrate by bombarding it with high‑energy particles) at 350°C
Wafer heaters can directly affect the properties of deposited thin films, including impacts on adhesion and chemical reactions. They are critical for
ensuring heating uniformity to achieve uniform thin‑film deposition.
ensuring heating uniformity to achieve uniform thin‑film deposition.
Types of Wafer Heaters
The selection of (mineral‑insulated) wafer heaters depends on the intended application. Given the highly specialized and critical nature of thin‑film
deposition processes, our heating solutions are usually custom‑engineered to account for all process parameters and desired end results. We focus on
the following categories of heaters:
deposition processes, our heating solutions are usually custom‑engineered to account for all process parameters and desired end results. We focus on
the following categories of heaters:
• A range of standard disc heaters
◦ 5 cm to 16 cm in diameter
◦ Universal mounts are provided, enabling customers to thread or weld the discs to their specific fixtures
• Custom substrate/platen heaters
◦ Co‑designed with customers to fully match the application environment in terms of size, shape, sheath material and other aspects
Whichever heater you choose at Fullchance, the high quality of our products and the expertise of our consultants guarantee thermal uniformity, which is
critical for thin‑film deposition systems.
critical for thin‑film deposition systems.
Specifications and Physical Properties
In an effort to ensure wafer heaters are perfectly adapted to each application, Fullchance takes numerous variables and specifications into consideration:
• Different types of base‑material heating elements are available in various (customizable) shapes, sizes and lengths.
• Electrical connections are hermetically sealed. Seal selection depends on vacuum level and the presence of chemicals/contaminants.
• Helium leak testing is performed to guarantee vacuum integrity.
• Vacuum flanges ("O"‑rings) can be used to connect power supplies and sensor cables outside the vacuum. Our cermet heating connectors are also useful accessories worthy of consideration for this purpose.
• Hot and cold sections can be customized.
• Welded outer sheaths can be provided to minimize contamination in hazardous environments, for example, stainless steel or Inconel 600.
• Internal thermocouples can be incorporated to precisely monitor the heat generated.
All these options mean we can supply wafer heaters resistant to oxidizing, inert, reducing and (high) vacuum environments. Our mineral‑insulated wafer heaters feature an extremely wide temperature range, making them suitable for all deposition processes, even up to 1000°C. Furthermore, thanks to the sheath, the wafer heaters deliver high responsiveness and excellent mechanical strength.
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