Thermal Control
has a significant impact on throughput. For the popular 300‑mm wafer size, uniform heating across all chips is essential to achieve optimal yield.
emperature variations within a wafer can lead to yield loss. Semiconductor manufacturing involves multiple equipment stages, where wafers are handled
by electrostatic chucks. These chucks use static electricity to firmly hold wafers without causing damage, and modern versions feature integrated heaters.
This enables accurate temperature regulation to compensate for variations in plasma density and cooling‑gas distribution across the wafer surface.
Electrostatic chuck with built‑in heater
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What is an electrostatic chuck?
An electrostatic chuck is a device that uses electric force to hold objects in place. Its advantages include the ability to operate in a vacuum environment and to secure objects such as wafers without causing damage. For this reason, electrostatic chucks are widely used in the manufacturing processes of ultra‑precision equipment such as semiconductor manufacturing facilities.
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Challenges for Electrostatic Chucks with Integrated Heaters
Effective heater design is critical for uniform heating of semiconductor wafers, especially large‑size wafers exceeding 300 mm. As the heating capacity of the metal foils used in heaters increases, more complex design of the foil’s cross‑sectional dimensions and routing is required to raise its resistance and generate the desired amount of heat. In addition, modifications are necessary because thermal performance depends not only on heater design but also on the ceramic plate where the heater is mounted.
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proposal
| Fullchance offers etched metal heaters. |
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advantages
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Product Overview of Electrostatic Chuck Heater
Maximum Processing Size: 500mm
Minimum Processing Width: 30μm
Metal Thickness Exceeding 50μm
Etching only for copper foil processing and materials with attached insulators such as PI (Polyimide)
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| Numerical value ① | |
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The precision of micro‑machining is ±20% of the plate thickness.
The precision of the etching process is within ±20% of the plate thickness, with no burrs or particles. In addition, the etching process does not require expensive dies, so the cost remains very low even after multiple trial and verification cuts.
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| Value ② | |
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Support for Large Heaters
Given that UPT can handle etching with a maximum size of 600mm x 900mm, we can also supply heaters for 450mm wafer applications. We have extensive experience and high production capacity in 300mm wafer applications.
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| Value ③ | |
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World‑class Inspection System
The introduction of image‑inspection equipment equipped with artificial intelligence technology mainly started at mass‑production factories. This system’s capability to detect defective products is continuously improving. We are building a comprehensive quality system by boosting inspection output and quality.
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Specification Sheet








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