Fullchance provides high‑end heating solutions for a wide range of wafer‑processing applications in the semiconductor industry, including thin‑film
deposition systems such as CVD, PVD and ALD. In collaboration with ceramic suppliers, we offer mineral‑insulated wafer heaters (also known as
substrate heaters or platen heaters) engineered for critical operating conditions, with specifications tailored to meet the unique and diverse
requirements of these processes. While fully custom substrate heaters are often the optimal solution, we also supply a range of standard disk‑style
heaters. Regardless of customers’ choices, our products and recommendations are reliable, enhancing overall process stability by ensuring superior
temperature uniformity.
deposition systems such as CVD, PVD and ALD. In collaboration with ceramic suppliers, we offer mineral‑insulated wafer heaters (also known as
substrate heaters or platen heaters) engineered for critical operating conditions, with specifications tailored to meet the unique and diverse
requirements of these processes. While fully custom substrate heaters are often the optimal solution, we also supply a range of standard disk‑style
heaters. Regardless of customers’ choices, our products and recommendations are reliable, enhancing overall process stability by ensuring superior
temperature uniformity.
Product Summary
• Optimal temperature uniformity
• Suitable for heat treatment up to 1000°C
• Precise control of process temperature
• Reduced risk of contamination
• Hermetically sealed electrical connections
• Vacuum integrity verified via helium leak testing
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Types of Wafer Heaters
The selection of (mineral‑insulated) wafer heaters depends on the intended application. Given the highly specialized and critical nature of thin‑film deposition processes, our heating solutions are typically customized to account for all process parameters and desired end results. We focus on the following categories of heaters:
• A range of standard disc heaters
◦ Diameters from 5 cm to 16 cm
◦ General‑purpose supports are available, allowing customers to thread or weld the discs to their specific fixtures
• Custom substrate/platen heaters
◦ Co‑designed with customers to fully match the application environment in terms of size, shape, sheath material and other factors
Whichever heater you choose in Saint‑Berlin, the high quality of our products and the expertise of our consultants guarantee thermal uniformity, which is critical for thin‑film deposition systems.
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What is the purpose of a wafer heater?
Wafer heaters are mainly used in thin‑film deposition systems, especially in the semiconductor industry. They are also applied in solar panel manufacturing, nanotechnology, photolithography, annealing, and optical device industries. In these vacuum processes, ultra‑thin coatings (sometimes only a few atoms thick) are applied to surfaces under vacuum. A wide range of technologies are employed, all of which require different substrate heating elements whose characteristics and design are matched to the operating temperature and the type of deposited material.
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Our wafer heaters are used in the following processes:
• ALD (Atomic Layer Deposition) at 200°C to 400°C
• CVD (Chemical Vapor Deposition) above 900°C
• PVD (Physical Vapor Deposition) at 200°C to 400°C
• PLD (Pulsed Laser Deposition) at 500°C
• PECVD (Plasma‑Enhanced Chemical Vapor Deposition) at 200°C to 400°C
• Sputtering (coating substrates by bombarding them with high‑energy particles) at 350°C
Wafer heaters can directly affect the properties of deposited thin films, including impacts on adhesion and chemical reactions. They are critical for ensuring heating uniformity to achieve uniform thin‑film deposition.
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Specifications and Physical Properties
To strive to ensure wafer heaters are perfectly adapted to each application, Fullchance specialists will consider numerous
variables and specifications:
variables and specifications:
• Different types of base heating elements come in various (customizable) shapes, sizes and lengths.
• Electrical connections are sealed. The choice of seal depends on the vacuum level and the presence of chemicals/contaminants.
• Saint‑Berlin uses helium leak checking to guarantee vacuum integrity.
• Vacuum flanges ("O"‑rings) can be used to connect power supplies and sensor cables outside the vacuum. Our cermet heating connectors are also
useful accessories worth considering for this purpose.
useful accessories worth considering for this purpose.
• Hot and cold sections can be customized.
• Welded outer sheaths can be provided to minimize contamination in hazardous environments, for example, stainless steel or Inconel 600.
• Internal thermocouples can be included to precisely monitor the heat generated.
All these possibilities mean we can deliver wafer heaters resistant to oxidizing, inert, reducing and (high) vacuum environments. Our mineral‑insulated
wafer heaters feature an extremely wide temperature range, making them suitable for all deposition processes, even up to 1000°C. In addition, thanks
to the sheath, the wafer heaters offer high responsiveness and excellent mechanical strength. Saint‑Berlin Industries adheres to stringent quality‑testing
requirements.
Quality and Service of Fullchance
to the sheath, the wafer heaters offer high responsiveness and excellent mechanical strength. Saint‑Berlin Industries adheres to stringent quality‑testing
requirements.
Chuck Heaters and Wafer Heaters
A wafer chuck is essentially a tool used to secure and hold semiconductor wafers during manufacturing. A chuck heater is a type of wafer heater equipped
with a mechanism to hold the wafer in place during heating. The primary purpose of a chuck heater is to ensure the wafer is maintained at the optimal
temperature for specific processes such as deposition, etching, photolithography and annealing.
with a mechanism to hold the wafer in place during heating. The primary purpose of a chuck heater is to ensure the wafer is maintained at the optimal
temperature for specific processes such as deposition, etching, photolithography and annealing.
Chuck heaters are integrated into wafer chucks in multiple ways. We supply embedded heating elements for them. These heating elements are incorporated
directly into the chuck body. They can deliver uniform heating across the chuck surface, which is critical for keeping the wafer at a homogeneous temperature.
directly into the chuck body. They can deliver uniform heating across the chuck surface, which is critical for keeping the wafer at a homogeneous temperature.
Quality and Service of Fullchance
The wafer heater series is independently developed and supplied by Fullchance. With decades of experience in the heating field, they are one of our longest‑term
partners. The partnership established between Fullchance and ceramic suppliers ensures comprehensive technical support for designing custom heating solutions
or adjusting current ranges to meet the needs of specific applications.
partners. The partnership established between Fullchance and ceramic suppliers ensures comprehensive technical support for designing custom heating solutions
or adjusting current ranges to meet the needs of specific applications.
In fact, one of the reasons whyFullchance supplies leading domestic semiconductor companies is our active support for the development of new custom heating
products. Especially for substrate heaters where temperature uniformity is critical, Fullchance conducts ongoing research and continuously improves thermal uniformity
solutions (such as multi‑zone or custom substrate heat sinks).
products. Especially for substrate heaters where temperature uniformity is critical, Fullchance conducts ongoing research and continuously improves thermal uniformity
solutions (such as multi‑zone or custom substrate heat sinks).
customer service1 